Nikon TU Plan ELWD 20x/0.40 B M25 Thread Size Microscope Objective

Nikon TU Plan ELWD 20x/0.40 B Microscope Objective | MUE21200

The Nikon TU Plan ELWD 20x/0.40 B objective is engineered for extended working distance applications requiring high clarity and flatness across the field. With its brightfield-optimized design and long working distance, it is well suited for inspecting larger or uneven specimens without immersion media. Commonly used in industrial and materials science imaging.

Condition

Refurbished/Used (This product has been inspected and verified to meet manufacturer specifications)

Key Features

• Extra-long working distance (ELWD) for non-contact or coverglass-free imaging
• High NA of 0.40 for detailed imaging in transmitted or reflected light
• Plan correction for excellent image flatness
• Brightfield optimized for use in metallurgical and materials inspection systems
• Infinity-corrected optical design

Applications

• Semiconductor inspection
• Metallurgy and materials analysis
• Industrial microscopy
• Brightfield imaging of thick or uneven samples

Specifications