Zeiss LD EC Epiplan-NEOFLUAR 100x/0.75 HD DIC M27 Thread Size Microscope Objective

Zeiss LD EC Epiplan-NEOFLUAR 100x/0.75 HD DIC Objective – 1156-538

The Zeiss LD EC Epiplan-NEOFLUAR 100x/0.75 HD DIC (Catalog No. 1156-538) is a high-magnification reflected light objective designed for advanced surface imaging using differential interference contrast (DIC). With its high numerical aperture of 0.75, this infinity-corrected objective delivers superior resolution, contrast, and color correction. The long working distance (LD) design makes it ideal for thick, coated, or uneven specimens often found in semiconductor, materials science, and metallurgy labs.

This objective offers outstanding flatness across the field and is engineered to meet the demands of high-definition industrial and research applications that require precision surface visualization.

Condition

Refurbished/Used
Condition: Refurbished/Used (This product has been inspected and verified to meet manufacturer specifications)

Key Features

• 100x magnification with 0.75 high numerical aperture
• DIC-compatible for enhanced contrast on challenging surface features
• Long working distance design for greater sample clearance
• EC NEOFLUAR optics with superior flat field and chromatic correction
• Infinity-corrected for seamless use with modern Zeiss systems
• Ideal for surface metrology, materials science, and high-resolution inspection

Applications

• Semiconductor & Wafer Imaging
• Metallography & Failure Analysis
• Microstructure and Thin Film Inspection
• Differential Interference Contrast (DIC) Microscopy
• High-Resolution Surface Imaging

Specifications